The EtherCAT Technology Group has partnered with industry leaders to create a Specific Device Profile for Semiconductor Process Control Valves termed ETG.5003.2030. A Process Control Valve is an electromechanical assembly used as either a pressure, flow or position controller.
ETG.5003.2030 describes the networks visible component of a semiconductor process control valve. This SDP identifies two different types of Process Control Valves: Upstream Pressure Controller (UPC) and Downstream Pressure Controller (DPC). UPCs control to a pressure setpoint through regulation of gas flow upstream of the process chamber (between the gas supply source and process chamber). DPCs are very similar (often called "direct") but they are found downstream of the process chamber between the chamber and the vacuum pump. The SDP specifications for each are extremely similar with slight changes in the object dictionaries and power connector requirements.
You will need to start with finding an EtherCAT slave controller and EtherCAT slave software stack to implement general EtherCAT communication. Then you can begin building out the CDP and SDP. Implementation of this SDP must be done in conjunction with the CDP because much of the SDP is based on CDP specifications. Most of this SDP pertains to software requirements specifically for the devices object dictionary and PDO mapping. Implementation of this SDP requires detailed knowledge of the SDP specification and your device's application.
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HMS offers hardware, software, and development services throughout each step in this process. HMS's experience and expertise in industrial communications can be leveraged to develop some or all of your SDP and CDP. See the chart below to review how HMS can help through the full ETG.5003 development process:
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